Crystalline SrBi < inf > 4 < /inf > Ti < inf > 4 < /inf > O < inf > 15 < /inf >  thin films on amorphous substrates sputtered by rf sputtering

dc.contributor.author	Rambabu, A.
dc.contributor.author	Raju, K. C.James
dc.date.accessioned	2022-03-27T11:43:33Z
dc.date.available	2022-03-27T11:43:33Z
dc.date.issued	2013-03-15
dc.description.abstract	Crystalline SrBi4Ti4O15 (SBTi) thin films were successfully deposited on amorphous fused silica substrates using rf sputtering technique. Homogeneous and crystallized films were obtained by optimizing the deposition and annealing conditions. The structural, morphological and optical properties of the films were investigated. As deposited films are amorphous in nature but crystallized on annealing at 600°C. AFM reveals the fine grain morphology on annealing. The refractive index and optical band gap of the films are ranged between 1.7-2 and 3.4 - 3.15eV respectively. © 2013 American Institute of Physics.
dc.identifier.citation	AIP Conference Proceedings. v.1512
dc.identifier.issn	0094243X
dc.identifier.uri	10.1063/1.4791248
dc.identifier.uri	http://aip.scitation.org/doi/abs/10.1063/1.4791248
dc.identifier.uri	https://dspace.uohyd.ac.in/handle/1/14576
dc.subject	crystalline films
dc.subject	optical properties
dc.subject	rf sputtering
dc.subject	SrBi Ti O thin films 4 4 15
dc.title	Crystalline SrBi < inf > 4 < /inf > Ti < inf > 4 < /inf > O < inf > 15 < /inf > thin films on amorphous substrates sputtered by rf sputtering
dc.type	Conference Proceeding. Conference Paper
dspace.entity.type

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