A review of ion beam assisted deposition of optical thin films
A review of ion beam assisted deposition of optical thin films
| dc.contributor.author | Mohan, S. | |
| dc.contributor.author | Krishna, M. Ghanashyam | |
| dc.date.accessioned | 2022-03-27T06:40:45Z | |
| dc.date.available | 2022-03-27T06:40:45Z | |
| dc.date.issued | 1995-01-01 | |
| dc.description.abstract | A review of the current status of ion assisted deposition of optical thin films is presented. The different kinds of ion sources and their relative merits and demerits are discussed. This is followed by a discussion of the various theoretical models currently in use to explain ion-surface interactions in such a process and finally the properties of oxide thin films deposited using ion assisted deposition are discussed. © 1995. | |
| dc.identifier.citation | Vacuum. v.46(7) | |
| dc.identifier.issn | 0042207X | |
| dc.identifier.uri | 10.1016/0042-207X(95)00001-1 | |
| dc.identifier.uri | https://www.sciencedirect.com/science/article/abs/pii/0042207X95000011 | |
| dc.identifier.uri | https://dspace.uohyd.ac.in/handle/1/9626 | |
| dc.title | A review of ion beam assisted deposition of optical thin films | |
| dc.type | Journal. Article | |
| dspace.entity.type |
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