Effect of substrate temperature on structure and magnetic properties of Co  < inf > 2 < /inf >  FeSi/Si(001) thin films

dc.contributor.author	Hazra, Binoy Krishna
dc.contributor.author	Kumari, T. Prasanna
dc.contributor.author	Raja, M. Manivel
dc.contributor.author	Kamat, S. V.
dc.contributor.author	Srinath, S.
dc.date.accessioned	2022-03-27T11:30:44Z
dc.date.available	2022-03-27T11:30:44Z
dc.date.issued	2015-06-24
dc.description.abstract	Co 2 FeSi thin films were grown onto Si(001) by UHV magnetron sputtering at different substrate temperatures (RT, 300, 400, 450, 500 and 550°C) keeping other sputtering conditions same. The films are disordered at low substrate temperatures and may transform into partially ordered B2 and fully ordered L2 1 phases upon increasing substrate temperatures. X-ray reflectivity analysis revealed an increase in surface roughness with increase in substrate temperature. The GIXRD measurements confirmed the reflectivity results. The magnetic properties of the prepared Co 2 FeSi films are investigated and correlated with the structural properties.
dc.identifier.citation	AIP Conference Proceedings. v.1665
dc.identifier.issn	0094243X
dc.identifier.uri	10.1063/1.4918203
dc.identifier.uri	http://aip.scitation.org/doi/abs/10.1063/1.4918203
dc.identifier.uri	https://dspace.uohyd.ac.in/handle/1/13666
dc.subject	Heusler alloy
dc.subject	Magnetic properties
dc.subject	Magnetron sputtering
dc.subject	XRR
dc.title	Effect of substrate temperature on structure and magnetic properties of Co < inf > 2 < /inf > FeSi/Si(001) thin films
dc.type	Conference Proceeding. Conference Paper
dspace.entity.type

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