Growth and characterization of sputtered BSTO/BaM multilayers

dc.contributor.author	Srinath, S.
dc.contributor.author	Frey, N. A.
dc.contributor.author	Heindl, R.
dc.contributor.author	Srikanth, H.
dc.contributor.author	Coffey, K. R.
dc.contributor.author	Dudney, N. J.
dc.date.accessioned	2022-03-27T11:31:04Z
dc.date.available	2022-03-27T11:31:04Z
dc.date.issued	2005-05-15
dc.description.abstract	Multilayers of Ba0.5 Sr0.5 Ti O3 (BSTO) and Ba Fe12 O19 (BaM), with tunable permeability and permittivity are attractive systems for radio frequency and microwave applications. We have grown multilayers of BSTO and BaM using magnetron sputtering on Al2 O3 substrates. Film growth conditions such as sputtering parameters were optimized to obtain high quality multilayers. X-ray diffraction established that both BSTO and BaM were formed and cross-sectional SEM studies showed sharp interfaces between BSTO and BaM layers. Magnetization showed a large coercivity (~2000 Oe) consistent with the hexaferrite component. The hysteresis loops also revealed the distinct influence of magnetocrystalline and shape anisotropies at different temperatures. © 2005 American Institute of Physics.
dc.identifier.citation	Journal of Applied Physics. v.97(10)
dc.identifier.issn	00218979
dc.identifier.uri	10.1063/1.1853874
dc.identifier.uri	http://aip.scitation.org/doi/10.1063/1.1853874
dc.identifier.uri	https://dspace.uohyd.ac.in/handle/1/13728
dc.title	Growth and characterization of sputtered BSTO/BaM multilayers
dc.type	Journal. Conference Paper
dspace.entity.type

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