Faster Biometric Authentication System using Fan and Vercauteren Scheme

Abstract

This paper proposes a novel generic 2-factor biometric authentication scheme that provides resistance against quantum attacks and runs faster than the existing scheme (Higo [1]) in terms of enrolment and authentication time. The 2-factor authentication eliminates the risk of client impersonation as the Protected Template (PT) is based on the hardness of Ring Learning With Errors (RLWE), which ensures the security of the biometrics. Higo's scheme [1] is specific to fingerprint biometrics whereas the proposed scheme is generic enough to any type of biometric authentication.