Electric-field-induced nanostructuring of metallic thin films

dc.contributor.author Kumar, Prashant
dc.contributor.author Krishna, M. Ghanashyam
dc.contributor.author Bhattacharya, A. K.
dc.date.accessioned 2022-03-27T06:39:57Z
dc.date.available 2022-03-27T06:39:57Z
dc.date.issued 2008-01-01
dc.description.abstract The nanostructuring of thin Ni and In films by postdeposition electric field treatment is presented. Electric-field-induced nanostructuring effects, such as organization into an array of nanoparticles, formation of nanowires and transition from amorphous to nanocrystalline states, are demonstrated. It is further shown that the nanostructures can be manipulated by simply changing the direction of the applied field. Control parameters include separation of field probes (25 mm), duration (2060 s) and direction of the field applied, and thickness (10100 nm). High fields cause field-induced emission in the films. It is observed that while the microstructural reconstruction of the surfaces can be manipulated, the amorphouscrystalline transition is irreversible. © 2008 World Scientific Publishing Company.
dc.identifier.citation International Journal of Nanoscience. v.7(4-5)
dc.identifier.issn 0219581X
dc.identifier.uri 10.1142/s0219581x08005407
dc.identifier.uri https://www.worldscientific.com/doi/abs/10.1142/S0219581X08005407
dc.identifier.uri https://dspace.uohyd.ac.in/handle/1/9460
dc.subject Atomic force microscopy
dc.subject Metallic thin films
dc.subject Nanowires
dc.subject Self-organization
dc.title Electric-field-induced nanostructuring of metallic thin films
dc.type Journal. Article
dspace.entity.type
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