Microstructure, structure, mechanical, and salt fog resistance properties of titanium nitride films on AZ31B Mg-alloy

Abstract

TiN films were grown by DC reactive magnetron sputtering at ambient temperature on Mg-alloy substrates for salt fog test and on Si-substrates for optimizing the process parameters. Argon and nitrogen were used as the reactive gases. The nitrogen percentage in the mixture (Ar+N 2 ) was varied from 5-15% to determine the optimized parameters required to achieve stoichiometricTiN. Characterization studies on the structure, microstructure, and mechanical properties were carried out. The films were also subjected to salt fog test to evaluate their corrosion resistance.