Initial growth of nanocrystalline diamond/ Β-SiC composite films: A competitive deposition process

dc.contributor.author Srikanth, Vadali V.S.S.
dc.contributor.author Tan, M. H.
dc.contributor.author Jiang, X.
dc.date.accessioned 2022-03-27T04:03:53Z
dc.date.available 2022-03-27T04:03:53Z
dc.date.issued 2006-02-24
dc.description.abstract Although nanocrystalline diamond/ Β-SiC composite gradient interlayers have been successfully deposited in dealing with the problem of diamond thin-film adhesion to metallic substrates, initial growth process of the two components has not been described, so far. In this letter, we propose that the deposition of composite interlayer is possible because of a selective growth process of diamond and Β-SiC phases. There is a competition between the diamond and the Β-SiC crystallites to occupy the spaces available on the substrate. The space competition is during the initial nucleation period of the process and also during film growth, leading to the formation of the nanocrystalline composite. The secondary nucleation of Β-SiC on the existing diamond surfaces depends on the flux of incoming Β-SiC forming gas species. This provides us with a possibility to control phase structure and composition of the composite film by adjusting the tetramethyl silane flow rate. © 2006 American Institute of Physics.
dc.identifier.citation Applied Physics Letters. v.88(7)
dc.identifier.issn 00036951
dc.identifier.uri 10.1063/1.2175478
dc.identifier.uri http://aip.scitation.org/doi/10.1063/1.2175478
dc.identifier.uri https://dspace.uohyd.ac.in/handle/1/6129
dc.title Initial growth of nanocrystalline diamond/ Β-SiC composite films: A competitive deposition process
dc.type Journal. Article
dspace.entity.type
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