Studies of electronic sputtering of fullerene under swift heavy ion impact

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dc.contributor.author Ghosh, S.
dc.contributor.author Avasthi, D. K.
dc.contributor.author Tripathi, A.
dc.contributor.author Srivastava, S. K.
dc.contributor.author Nageswara Rao, S. V.S.
dc.contributor.author Som, T.
dc.contributor.author Mittal, V. K.
dc.contributor.author Grüner, F.
dc.contributor.author Assmann, W.
dc.date.accessioned 2022-03-27T06:42:55Z
dc.date.available 2022-03-27T06:42:55Z
dc.date.issued 2002-05-01
dc.description.abstract The present work reports the dependence of electronic sputtering on thickness of fullerene film. The energetic ions of 200 MeV Au15+ are taken from NSC Pelletron at New Delhi and the Tandem accelerator at Munich. On-line elastic recoil detection analysis (ERDA) with ΔE-E telescope detector is used to determine the electronic sputtering yield. We observed systematic decrease in sputtering yield of carbon with increase in film (C60/silicon) thickness. © 2002 Elsevier Science B.V. All rights reserved.
dc.identifier.citation Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms. v.190(1-4)
dc.identifier.issn 0168583X
dc.identifier.uri 10.1016/S0168-583X(02)00474-3
dc.identifier.uri https://www.sciencedirect.com/science/article/abs/pii/S0168583X02004743
dc.identifier.uri https://dspace.uohyd.ac.in/handle/1/9879
dc.subject Elastic recoil detection analysis
dc.subject Electron-phonon coupling
dc.subject Electronic sputtering
dc.subject Fullerene
dc.subject Swift heavy ion
dc.title Studies of electronic sputtering of fullerene under swift heavy ion impact
dc.type Journal. Conference Paper
dspace.entity.type
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