Ambient temperature growth of nanocrystalline titanium dioxide thin films

dc.contributor.author	Pamu, D.
dc.contributor.author	Krishna, M. Ghanashyam
dc.contributor.author	Raju, K. C.James
dc.contributor.author	Bhatnagar, Anil K.
dc.date.accessioned	2022-03-27T06:40:12Z
dc.date.available	2022-03-27T06:40:12Z
dc.date.issued	2005-07-01
dc.description.abstract	Nanocrystalline titania thin films have been deposited at ambient temperature by Dc magnetron sputtering. The crystallite size in the films varies between 25 and 50 nm as calculated from the X-ray diffraction patterns and is dependent on both oxygen pressure as well as thickness of the films. Significantly even at 100% oxygen in the sputtering gas, films of thickness of the order of 500 nm have been grown starting from the metallic Ti target. Optical constants of the films are strongly dependent on process parameters Atomic force microscopy images indicate that the crystallites form large triangular grains of the order of 70-100 nm. © 2005 Elsevier Ltd. All rights reserved.
dc.identifier.citation	Solid State Communications. v.135(1-2)
dc.identifier.issn	00381098
dc.identifier.uri	10.1016/j.ssc.2005.04.003
dc.identifier.uri	https://www.sciencedirect.com/science/article/abs/pii/S0038109805003273
dc.identifier.uri	https://dspace.uohyd.ac.in/handle/1/9526
dc.subject	A. Nanostructures
dc.subject	A. Thin films
dc.subject	C. Crystal structure and symmetry
dc.subject	D. Optical properties
dc.title	Ambient temperature growth of nanocrystalline titanium dioxide thin films
dc.type	Journal. Article
dspace.entity.type

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