Microwave dielectric and optical properties of amorphous and crystalline Ba < inf > 0.5 < /inf > Sr < inf > 0.5 < /inf > TiO < inf > 3 < /inf > thin films

dc.contributor.author Pundareekam Goud, J.
dc.contributor.author Joseph, Andrews
dc.contributor.author Ramakanth, S.
dc.contributor.author Naidu, Kuna Lakshun
dc.contributor.author James Raju, K. C.
dc.date.accessioned 2022-03-27T11:42:12Z
dc.date.available 2022-03-27T11:42:12Z
dc.date.issued 2016-05-06
dc.description.abstract The thin films of composition Ba0.5Sr0.5TiO3 (BST5) were deposited by Pulsed Laser Deposition technique on amorphous fused silica substrates at room temperature (RT) and at 700°C. The film deposited at RT is amorphous while the other crystallized in cubic structure. The refractive index (n) and optical band gap (Eg) extracted from transmission spectra in the 190-2500nm range. Microwave dielectric properties were investigated using the Split Post Dielectric Resonators (SPDR) technique at spot frequencies of 10GHz and 20GHz. The experimental results show that thin films deposited at high temperature (700°C) shows very high dielectric constant for both 10GHz and 20GHz. These high dielectric constant films can be used in a wide range of applications such as capacitors, non-volatile high speed random access memories, and electro-optic devices.
dc.identifier.citation AIP Conference Proceedings. v.1728
dc.identifier.issn 0094243X
dc.identifier.uri 10.1063/1.4946344
dc.identifier.uri http://aip.scitation.org/doi/abs/10.1063/1.4946344
dc.identifier.uri https://dspace.uohyd.ac.in/handle/1/14517
dc.subject Ba Sr TiO thin films 0.5 0.5 3
dc.subject Microwave dielectric properties
dc.subject Optical Properties
dc.subject Pulsed Laser Deposition
dc.subject SPDR
dc.title Microwave dielectric and optical properties of amorphous and crystalline Ba < inf > 0.5 < /inf > Sr < inf > 0.5 < /inf > TiO < inf > 3 < /inf > thin films
dc.type Conference Proceeding. Conference Paper
dspace.entity.type
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