Structure and composition related properties of titania thin films

dc.contributor.author	Krishna, M. Ghanashyam
dc.contributor.author	Kanakaraju, S.
dc.contributor.author	Mohan, S.
dc.date.accessioned	2022-03-27T06:40:54Z
dc.date.available	2022-03-27T06:40:54Z
dc.date.issued	1995-01-01
dc.description.abstract	The dependence of optical constants, structure and composition of titania thin films on the process parameters has been investigated. Films were deposited using both reactive electron beam evaporation and Ion Assisted Deposition (IAD). It has been observed that the refractive index of IAD films is higher than that for the reactively deposited films, without much difference in the extinction coefficient. Electron paramagnetic resonance has been used to estimate qualitatively the presence of non-stoichiometry in the films. It has been found that these spectra correlate very well the optical behaviour of the films. X-ray diffraction studies revealed that the neutral oxygen deposited films were stress free, while the IAD films showed tensile stress. The lattice parameters showed anisotropic change with ion beam parameters. © 1994.
dc.identifier.citation	Vacuum. v.46(1)
dc.identifier.issn	0042207X
dc.identifier.uri	10.1016/0042-207X(93)E0004-5
dc.identifier.uri	https://www.sciencedirect.com/science/article/abs/pii/0042207X93E00045
dc.identifier.uri	https://dspace.uohyd.ac.in/handle/1/9648
dc.title	Structure and composition related properties of titania thin films
dc.type	Journal. Article
dspace.entity.type

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