Chromium and nickel substituted iron oxide thin films by DC sputtering
Chromium and nickel substituted iron oxide thin films by DC sputtering
| dc.contributor.author | Kiran, M. S.R.N. | |
| dc.contributor.author | Sudheendran, K. | |
| dc.contributor.author | Ghanashyam Krishna, M. | |
| dc.contributor.author | James Raju, K. C. | |
| dc.contributor.author | Bhatnagar, Anil K. | |
| dc.date.accessioned | 2022-03-27T11:45:30Z | |
| dc.date.available | 2022-03-27T11:45:30Z | |
| dc.date.issued | 2006-09-16 | |
| dc.description.abstract | Chromium and nickel substituted iron oxide thin films have been deposited by DC sputtering. Films were coated in the thickness range of 130-400 nm, on boro silicate glass and quartz substrates. The films showed transmission as high as 90% in the visible region. The refractive index of the films was 1.6-2.1. The microwave dielectric constant varied as a function of composition from 24 to 12 at frequencies of 8.98 and 11.88 GHz. All the films were X-ray amorphous independent of deposition and post deposition annealing conditions. Surface morphology indicates that roughness is a function of both sputtering pressure as well as inter-electrode distance. © 2006 Elsevier Ltd. All rights reserved. | |
| dc.identifier.citation | Vacuum. v.81(1) | |
| dc.identifier.issn | 0042207X | |
| dc.identifier.uri | 10.1016/j.vacuum.2006.01.014 | |
| dc.identifier.uri | https://www.sciencedirect.com/science/article/abs/pii/S0042207X0600025X | |
| dc.identifier.uri | https://dspace.uohyd.ac.in/handle/1/14656 | |
| dc.title | Chromium and nickel substituted iron oxide thin films by DC sputtering | |
| dc.type | Journal. Article | |
| dspace.entity.type |
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