Statistics for Effect of process parameters and post deposition annealing on the optical, structural and microwave dielectric properties of RF magnetron sputtered (Ba < inf > 0.5 < /inf > ,Sr < inf > 0.5 < /inf > )TiO < inf > 3 < /inf > thin films
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| Effect of process parameters and post deposition annealing on the optical, structural and microwave dielectric properties of RF magnetron sputtered (Ba < inf > 0.5 < /inf > ,Sr < inf > 0.5 < /inf > )TiO < inf > 3 < /inf > thin films | 0 |
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