Ferromagnetic resonance study of Co < inf > 2 < /inf > FeSi thin films
Ferromagnetic resonance study of Co < inf > 2 < /inf > FeSi thin films
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Date
2016-05-23
Authors
Hazra, Binoy Krishna
Raja, M. Manivel
Srinath, S.
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Abstract
50 nm Co2FeSi thin films were deposited on Si (111) by ultra high vaccum dc magnetron sputtering at different substrate temperatures 300°C, 450°C, 550°C and 600°C. The films are characterized by grazing incidence xrd, magnetic and ferromagnetic resonance measurements. The film deposited at 550°C has B2 crystal structure with high magnetization and low coercivity. Ferromagnetic resonance and magnetic measurements are used as a tool to investigate the homogeneity of Co2FeSi thin films.
Description
Keywords
Ferromagnetic resonance,
Gilbert damping constant,
Heusler alloy
Citation
AIP Conference Proceedings. v.1731