Ferromagnetic resonance study of Co < inf > 2 < /inf > FeSi thin films

dc.contributor.author	Hazra, Binoy Krishna
dc.contributor.author	Raja, M. Manivel
dc.contributor.author	Srinath, S.
dc.date.accessioned	2022-03-27T11:30:40Z
dc.date.available	2022-03-27T11:30:40Z
dc.date.issued	2016-05-23
dc.description.abstract	50 nm Co2FeSi thin films were deposited on Si (111) by ultra high vaccum dc magnetron sputtering at different substrate temperatures 300°C, 450°C, 550°C and 600°C. The films are characterized by grazing incidence xrd, magnetic and ferromagnetic resonance measurements. The film deposited at 550°C has B2 crystal structure with high magnetization and low coercivity. Ferromagnetic resonance and magnetic measurements are used as a tool to investigate the homogeneity of Co2FeSi thin films.
dc.identifier.citation	AIP Conference Proceedings. v.1731
dc.identifier.issn	0094243X
dc.identifier.uri	10.1063/1.4948158
dc.identifier.uri	http://aip.scitation.org/doi/abs/10.1063/1.4948158
dc.identifier.uri	https://dspace.uohyd.ac.in/handle/1/13652
dc.subject	Ferromagnetic resonance
dc.subject	Gilbert damping constant
dc.subject	Heusler alloy
dc.title	Ferromagnetic resonance study of Co < inf > 2 < /inf > FeSi thin films
dc.type	Conference Proceeding. Conference Paper
dspace.entity.type

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