Metal nanoparticles in dielectric media: Physical vapor deposited HfO < inf > 2 < /inf > & amp; Ag multilayers for MOS device and SPR applications
Metal nanoparticles in dielectric media: Physical vapor deposited HfO < inf > 2 < /inf > & amp; Ag multilayers for MOS device and SPR applications
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Date
2020-11-05
Authors
Mangababu, A.
Arun, N.
Vinod Kumar, K.
Pathak, A. P.
Nageswara Rao, S. V.S.
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Abstract
Multilayered films of Hafnium Oxide & Silver are grown using e-beam evaporation system and then they are annealed at different temperatures. UV-VIS-NIR absorption spectra shows the Surface Plasmon Resonance(SPR) at707 nmfor as grown sample (room temperature) and a huge shifted SPR at 542 nm for the sample annealed at 4000C. FESEM confirms the increase in the particle size and EDX confirms the presence of Ag. From the IV-CV measurements, it is clear that these samples are having a wide charge storage window of about 2volts in as deposited sample which decreases with increase in the annealing temperature.
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AIP Conference Proceedings. v.2265