Metal nanoparticles in dielectric media: Physical vapor deposited HfO < inf > 2 < /inf > & amp; Ag multilayers for MOS device and SPR applications
Metal nanoparticles in dielectric media: Physical vapor deposited HfO < inf > 2 < /inf > & amp; Ag multilayers for MOS device and SPR applications
| dc.contributor.author | Mangababu, A. | |
| dc.contributor.author | Arun, N. | |
| dc.contributor.author | Vinod Kumar, K. | |
| dc.contributor.author | Pathak, A. P. | |
| dc.contributor.author | Nageswara Rao, S. V.S. | |
| dc.date.accessioned | 2022-03-27T06:42:21Z | |
| dc.date.available | 2022-03-27T06:42:21Z | |
| dc.date.issued | 2020-11-05 | |
| dc.description.abstract | Multilayered films of Hafnium Oxide & Silver are grown using e-beam evaporation system and then they are annealed at different temperatures. UV-VIS-NIR absorption spectra shows the Surface Plasmon Resonance(SPR) at707 nmfor as grown sample (room temperature) and a huge shifted SPR at 542 nm for the sample annealed at 4000C. FESEM confirms the increase in the particle size and EDX confirms the presence of Ag. From the IV-CV measurements, it is clear that these samples are having a wide charge storage window of about 2volts in as deposited sample which decreases with increase in the annealing temperature. | |
| dc.identifier.citation | AIP Conference Proceedings. v.2265 | |
| dc.identifier.issn | 0094243X | |
| dc.identifier.uri | 10.1063/5.0016821 | |
| dc.identifier.uri | http://aip.scitation.org/doi/abs/10.1063/5.0016821 | |
| dc.identifier.uri | https://dspace.uohyd.ac.in/handle/1/9823 | |
| dc.title | Metal nanoparticles in dielectric media: Physical vapor deposited HfO < inf > 2 < /inf > & amp; Ag multilayers for MOS device and SPR applications | |
| dc.type | Conference Proceeding. Conference Paper | |
| dspace.entity.type |
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