Surface roughness characterization of plasma textured polycrystalline silicon solar wafer with the laser speckle technique
Surface roughness characterization of plasma textured polycrystalline silicon solar wafer with the laser speckle technique
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Date
2020-11-02
Authors
Balamurugan, R.
Prakasam, R.
Jeeva, B.
Anupriyanka, T.
Shanmugavelayutham, G.
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Abstract
Surface roughness characterization of plasma textured polycrystalline silicon solar wafer is estimated at different DC potentials by image processing. Laser speckle based Fractal dimension is a cross-scale surface descriptor of roughness. This investigation shows that surface roughness of the samples increases due to plasma processing in the measured range.
Description
Keywords
Fractal dimension,
Laser speckle,
Plasma texturing,
Polycrystalline silicon solar wafer,
Surface roughness
Citation
AIP Conference Proceedings. v.2270