Surface roughness characterization of plasma textured polycrystalline silicon solar wafer with the laser speckle technique

dc.contributor.author	Balamurugan, R.
dc.contributor.author	Prakasam, R.
dc.contributor.author	Jeeva, B.
dc.contributor.author	Anupriyanka, T.
dc.contributor.author	Shanmugavelayutham, G.
dc.date.accessioned	2022-03-27T08:38:49Z
dc.date.available	2022-03-27T08:38:49Z
dc.date.issued	2020-11-02
dc.description.abstract	Surface roughness characterization of plasma textured polycrystalline silicon solar wafer is estimated at different DC potentials by image processing. Laser speckle based Fractal dimension is a cross-scale surface descriptor of roughness. This investigation shows that surface roughness of the samples increases due to plasma processing in the measured range.
dc.identifier.citation	AIP Conference Proceedings. v.2270
dc.identifier.issn	0094243X
dc.identifier.uri	10.1063/5.0019445
dc.identifier.uri	http://aip.scitation.org/doi/abs/10.1063/5.0019445
dc.identifier.uri	https://dspace.uohyd.ac.in/handle/1/11349
dc.subject	Fractal dimension
dc.subject	Laser speckle
dc.subject	Plasma texturing
dc.subject	Polycrystalline silicon solar wafer
dc.subject	Surface roughness
dc.title	Surface roughness characterization of plasma textured polycrystalline silicon solar wafer with the laser speckle technique
dc.type	Conference Proceeding. Conference Paper
dspace.entity.type

Now showing 1 - 1 of 1