Effect of substrate temperature on structure and magnetic properties of Co < inf > 2 < /inf > FeSi/Si(001) thin films
Effect of substrate temperature on structure and magnetic properties of Co < inf > 2 < /inf > FeSi/Si(001) thin films
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Date
2015-06-24
Authors
Hazra, Binoy Krishna
Kumari, T. Prasanna
Raja, M. Manivel
Kamat, S. V.
Srinath, S.
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Abstract
Co 2 FeSi thin films were grown onto Si(001) by UHV magnetron sputtering at different substrate temperatures (RT, 300, 400, 450, 500 and 550°C) keeping other sputtering conditions same. The films are disordered at low substrate temperatures and may transform into partially ordered B2 and fully ordered L2 1 phases upon increasing substrate temperatures. X-ray reflectivity analysis revealed an increase in surface roughness with increase in substrate temperature. The GIXRD measurements confirmed the reflectivity results. The magnetic properties of the prepared Co 2 FeSi films are investigated and correlated with the structural properties.
Description
Keywords
Heusler alloy,
Magnetic properties,
Magnetron sputtering,
XRR
Citation
AIP Conference Proceedings. v.1665