Studies of electronic sputtering of fullerene under swift heavy ion impact
Studies of electronic sputtering of fullerene under swift heavy ion impact
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Date
2002-05-01
Authors
Ghosh, S.
Avasthi, D. K.
Tripathi, A.
Srivastava, S. K.
Nageswara Rao, S. V.S.
Som, T.
Mittal, V. K.
Grüner, F.
Assmann, W.
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Abstract
The present work reports the dependence of electronic sputtering on thickness of fullerene film. The energetic ions of 200 MeV Au15+ are taken from NSC Pelletron at New Delhi and the Tandem accelerator at Munich. On-line elastic recoil detection analysis (ERDA) with ΔE-E telescope detector is used to determine the electronic sputtering yield. We observed systematic decrease in sputtering yield of carbon with increase in film (C60/silicon) thickness. © 2002 Elsevier Science B.V. All rights reserved.
Description
Keywords
Elastic recoil detection analysis,
Electron-phonon coupling,
Electronic sputtering,
Fullerene,
Swift heavy ion
Citation
Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms. v.190(1-4)